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Efficient and mild modification of Si surfaces via orthogonal hetero Diels-Alder chemistry

机译:通过正交异质Diels-Alder化学方法对硅表面进行高效温和的改性

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摘要

An efficient and mild modification of Si surfaces through orthogonal hetero Diels-Alder (HDA) chemistry, was investigated. The modification of Si wafers was achieved by the silanization of pretreated Si surfaces using 3-(N-strylmethyl-2-aminoethylamino)-propyl trimethoxy silane (SM-TMS). The RAFT-HDA reaction between the PSDTF functionalized PiBA and the styryl functionalized Si surface proceeds in the absence of catalysts at 60°C. The coupling reaction between Si surfaces modified with a styrene linker and PiBA-PSDTF was performed at 60° C in chloroform solution within 12 h. The conjugation leads to the formation of a 3,6-dihydro-2H-thiopyran ring, the stability of which has been investigated and found to be withstanding relatively harsh conditions of pH and heat. The surface modification was also confirmed by measuring the thickness through ellipsometry of the Si wafers after hydrolsis.
机译:研究了通过正交异质Diels-Alder(HDA)化学方法对硅表面进行的高效轻度改性。通过使用3-(N-硬脂基甲基-2-氨基乙基氨基)-丙基三甲氧基硅烷(SM-TMS)对预处理过的Si表面进行硅烷化来实现Si晶片的改性。 PSDTF官能化的PiBA和苯乙烯基官能化的Si表面之间的RAFT-HDA反应在没有催化剂的情况下于60°C进行。用苯乙烯连接基修饰的Si表面与PiBA-PSDTF之间的偶联反应是在60°C的氯仿溶液中在12小时内进行的。共轭导致形成3,6-二氢-2H-噻喃环,已对其稳定性进行了研究,发现其可承受相对苛刻的pH和热条件。还通过在水解后通过椭圆法测量Si晶片的厚度来确认表面改性。

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